The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films
文献类型：期刊论文
| 作者 | Wang P(王鹏) ; Zhang JY(张俊彦); Wang LP(王立平); Zhang GA(张广安)
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| 刊名 | Surface and Coatings Technology
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| 出版日期 | 2008 |
| 卷号 | 202页码:2684-2689 |
| 关键词 | Al-containing hydrogenated amorphous carbon Magnetron sputtering Applied substrate pulse bias Hardness Wear test |
| ISSN号 | 0257-8972 |
| 通讯作者 | 张俊彦 |
| 中文摘要 | Al-containing hydrogenated amorphous carbon (Al-C:H) films were prepared using a magnetron sputtering Al target in the CH4 and Ar mixture atmosphere with various applied substrate pulse negative bias voltages. The hydrogen content and internal stress of the film decrease dramatically with the substrate pulse bias voltage increase. However, the hardness values of the films keep at high level (∼20 GPa) without any obvious changes with the increase of the applied substrate pulse bias voltages. The Al-C:H film prepared at applied substrate high bias voltage shows a long wear life and low friction coefficient. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the Natural Science Foundation of China (Granted No 50323007;No. 60376039;No. 50772115);the “Hundreds Talent Program” of Chinese Academy of Sciences |
| 语种 | 英语 |
| 公开日期 | 2013-03-28 |
| 源URL | [http://210.77.64.217/handle/362003/2697]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 通讯作者 | Zhang JY(张俊彦) |
| 推荐引用方式 GB/T 7714 | Wang P,Zhang JY,Wang LP,et al. The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films[J]. Surface and Coatings Technology,2008,202:2684-2689. |
| APA | 王鹏,张俊彦,王立平,&张广安.(2008).The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films.Surface and Coatings Technology,202,2684-2689. |
| MLA | 王鹏,et al."The effect of applied substrate negative bias voltage on the structure and properties of Al-containing a-C:H thin films".Surface and Coatings Technology 202(2008):2684-2689. |
入库方式： OAI收割
来源：兰州化学物理研究所
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