Micro-patterning of TiO2 thin films by photovoltaic effect on silicon substrates
文献类型：期刊论文
| 作者 | Xue QJ(薛群基) ; Liu ZL(刘志鲁)
|
| 刊名 | Thin Solid Films
 |
| 出版日期 | 2008 |
| 卷号 | 516页码:3058-3061 |
| 关键词 | Patterning Charge transfer Band gap Mobility Irradiation |
| ISSN号 | 0040-6090 |
| 通讯作者 | 陈淼 |
| 中文摘要 | In this letter,micro-patterned TiO2 thin films were prepared on the Siwafer substrates by photogenerated carrierswithout using photoresist or self-assembled monolayers. The TiO2 particles deposited onto the unirradiated regions. The different trapping/detrapping dynamics of the electrons and holes cause the change of surface potential in the irradiated regions, thus patterned TiO2 thin films formed by the photovoltaic effect. The thickness of the TiO patterns is about 80 nm and the film is anatase after annealed at 500 ℃. This method is applied to get ZrO patterns on Si substrate. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the National Nature Science Foundation of China (Grant no. 20473106);the 973 Project (Grant no. 2007CB607605);the Innovation Group Project (Grant no. 50421502) of Chinese Ministry of Science and Technology |
| 语种 | 英语 |
| WOS记录号 | WOS:000254634600038 |
| 公开日期 | 2013-03-28 |
| 源URL | [http://210.77.64.217/handle/362003/2705]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Xue QJ,Liu ZL. Micro-patterning of TiO2 thin films by photovoltaic effect on silicon substrates[J]. Thin Solid Films,2008,516:3058-3061. |
| APA | 薛群基,&刘志鲁.(2008).Micro-patterning of TiO2 thin films by photovoltaic effect on silicon substrates.Thin Solid Films,516,3058-3061. |
| MLA | 薛群基,et al."Micro-patterning of TiO2 thin films by photovoltaic effect on silicon substrates".Thin Solid Films 516(2008):3058-3061. |
入库方式： OAI收割
来源：兰州化学物理研究所
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