Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition
文献类型:期刊论文
作者 | Jin, CG ; Yu, T ; Bo, Y ; Zhao, Y ; Zhang, HY ; Dong, YJ ; Wu, XM ; Zhuge, LJ ; Ge, SB |
刊名 | VACUUM
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出版日期 | 2012 |
卷号 | 86期号:8页码:1078-1082 |
关键词 | High-k dielectrics HfO2 ZrO2 Structure Optical properties |
ISSN号 | 0042-207X |
通讯作者 | Wu, XM (reprint author), Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China. |
中文摘要 | Hafnium-Zirconium-Oxide-Nitride (Hf1-xZrxO1-yNy) films are prepared by ion beam assisted deposition on p-Si and quartz substrates with a composite target of sintered high-purity HfO2 and ZrO2. The thermal stability and microstructure characteristics for H |
学科主题 | Materials Science; Physics |
收录类别 | 2012SCI-186 |
原文出处 | 10.1016/j.vacuum.2011.10.001 |
语种 | 英语 |
公开日期 | 2013-04-17 |
源URL | [http://ir.sim.ac.cn/handle/331004/114746] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Jin, CG,Yu, T,Bo, Y,et al. Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition[J]. VACUUM,2012,86(8):1078-1082. |
APA | Jin, CG.,Yu, T.,Bo, Y.,Zhao, Y.,Zhang, HY.,...&Ge, SB.(2012).Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition.VACUUM,86(8),1078-1082. |
MLA | Jin, CG,et al."Characterization of Hafnium-Zirconium-Oxide-Nitride films grown by ion beam assisted deposition".VACUUM 86.8(2012):1078-1082. |
入库方式: OAI收割
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