Chemical mechanical polishing of stainless steel foil as flexible substrate
文献类型:期刊论文
作者 | Hu, XK ; Song, ZT ; Liu, WL ; Qin, F ; Zhang, ZF ; Wang, HB |
刊名 | APPLIED SURFACE SCIENCE
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出版日期 | 2012 |
卷号 | 258期号:15页码:5798-5802 |
关键词 | Chemical mechanical polish Stainless steel Flexible substrate Colloidal silica Electrochemical corrosion |
ISSN号 | 0169-4332 |
通讯作者 | Hu, XK (reprint author), Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Lab Nanotechnol, State Key Lab Funct Mat Informat, 865 Changning Rd, Shanghai 200050, Peoples R China. |
中文摘要 | Stainless steel foils as thin as 120 mu m are polished to meet the requirement of low roughness for fabricating flexible thin-film transistors on them used in display or sensor. Using the colloidal silica as abrasives in the chemical mechanical polishing |
学科主题 | Chemistry; Materials Science; Physics |
收录类别 | 2012SCI-120 |
原文出处 | 10.1016/j.apsusc.2012.02.100 |
语种 | 英语 |
公开日期 | 2013-04-17 |
源URL | [http://ir.sim.ac.cn/handle/331004/114749] ![]() |
专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
推荐引用方式 GB/T 7714 | Hu, XK,Song, ZT,Liu, WL,et al. Chemical mechanical polishing of stainless steel foil as flexible substrate[J]. APPLIED SURFACE SCIENCE,2012,258(15):5798-5802. |
APA | Hu, XK,Song, ZT,Liu, WL,Qin, F,Zhang, ZF,&Wang, HB.(2012).Chemical mechanical polishing of stainless steel foil as flexible substrate.APPLIED SURFACE SCIENCE,258(15),5798-5802. |
MLA | Hu, XK,et al."Chemical mechanical polishing of stainless steel foil as flexible substrate".APPLIED SURFACE SCIENCE 258.15(2012):5798-5802. |
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