中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs

文献类型:期刊论文

作者Chen, J ; Luo, JX ; Wu, QQ ; Chai, Z ; Huang, XL ; Wei, X ; Wang, X
刊名NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
出版日期2012
卷号272页码:128-131
关键词Partially depleted SOI Floating-body effect The kink effect Esaki tunnel Junction Body contact
ISSN号0168-583X
通讯作者Chen, J (reprint author), Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China.
中文摘要Silicon-on-insulate (SOI) MOSFETs offer benefits over bulk competitors for fully isolation and smaller junction capacitance. The performance of partially depleted (PD) SOI MOSFETs, though, is not good enough. Since the body is floating, the extra holes (f
学科主题Instruments & Instrumentation; Nuclear Science & Technology; Physics
收录类别2012SCI-195
原文出处10.1016/j.nimb.2011.01.048
语种英语
公开日期2013-04-17
源URL[http://ir.sim.ac.cn/handle/331004/114770]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Chen, J,Luo, JX,Wu, QQ,et al. Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2012,272:128-131.
APA Chen, J.,Luo, JX.,Wu, QQ.,Chai, Z.,Huang, XL.,...&Wang, X.(2012).Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,272,128-131.
MLA Chen, J,et al."Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 272(2012):128-131.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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