中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Impact of back-gate bias on the hysteresis effect in partially depleted SOI MOSFETs

文献类型:期刊论文

作者Luo, JX ; Chen, J ; Zhou, JH ; Wu, QQ ; Chai, Z ; Yu, T ; Wang, X
刊名CHINESE PHYSICS B
出版日期2012
卷号21期号:5页码:56602
关键词floating body effect hysteresis effect back gate bias partially depleted (PD) SOI
ISSN号1674-1056
通讯作者Chen, J (reprint author), Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China.
中文摘要The hysteresis effect in the output characteristics, originating from the floating body effect, has been measured in partially depleted (PD) silicon-on-insulator (SOI) MOSFETs at different back-gate biases. I-D hysteresis has been developed to clarify the
学科主题Physics
收录类别2012SCI-129
原文出处10.1088/1674-1056/21/5/056602
语种英语
公开日期2013-04-17
源URL[http://ir.sim.ac.cn/handle/331004/114782]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Luo, JX,Chen, J,Zhou, JH,et al. Impact of back-gate bias on the hysteresis effect in partially depleted SOI MOSFETs[J]. CHINESE PHYSICS B,2012,21(5):56602.
APA Luo, JX.,Chen, J.,Zhou, JH.,Wu, QQ.,Chai, Z.,...&Wang, X.(2012).Impact of back-gate bias on the hysteresis effect in partially depleted SOI MOSFETs.CHINESE PHYSICS B,21(5),56602.
MLA Luo, JX,et al."Impact of back-gate bias on the hysteresis effect in partially depleted SOI MOSFETs".CHINESE PHYSICS B 21.5(2012):56602.

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来源:上海微系统与信息技术研究所

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