中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
N-Doped Si0.6Sb2Te3 Material for Applications of Phase-Change Memory

文献类型:期刊论文

作者Peng, C ; Yang, PX ; Wu, LC ; Song, ZT ; Rao, F ; Xu, JA ; Zhou, XL ; Zhu, M ; Liu, B ; Chu, JH
刊名ELECTROCHEMICAL AND SOLID STATE LETTERS
出版日期2012
卷号15期号:4页码:H101-H104
ISSN号1099-0062
通讯作者Peng, C (reprint author), E China Normal Univ, Dept Elect, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China.
中文摘要Nitrogen incorporated Si0.6Sb2Te3 film shows higher crystallization temperature (similar to 185 degrees C) than Ge2Sb2Te5 (similar to 150 degrees C). No separated Si or Te phase is observed within crystalline nitrogen-doped Si0.6Sb2Te3 material (SST-N). N
学科主题Electrochemistry; Materials Science
收录类别2012SCI-241
原文出处10.1149/2.022204esl
语种英语
公开日期2013-04-17
源URL[http://ir.sim.ac.cn/handle/331004/114805]  
专题上海微系统与信息技术研究所_功能材料与器件_期刊论文
推荐引用方式
GB/T 7714
Peng, C,Yang, PX,Wu, LC,et al. N-Doped Si0.6Sb2Te3 Material for Applications of Phase-Change Memory[J]. ELECTROCHEMICAL AND SOLID STATE LETTERS,2012,15(4):H101-H104.
APA Peng, C.,Yang, PX.,Wu, LC.,Song, ZT.,Rao, F.,...&Chu, JH.(2012).N-Doped Si0.6Sb2Te3 Material for Applications of Phase-Change Memory.ELECTROCHEMICAL AND SOLID STATE LETTERS,15(4),H101-H104.
MLA Peng, C,et al."N-Doped Si0.6Sb2Te3 Material for Applications of Phase-Change Memory".ELECTROCHEMICAL AND SOLID STATE LETTERS 15.4(2012):H101-H104.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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