Solvent-infiltration imprint lithography: a novel method to prepare large area poly(3-hexylthiophene) micro/nano-patterns
文献类型：期刊论文
| 作者 | Wang, JH ; Min, GQ ; Song, ZT ; Ni, XY ; Zhou, WM ; Zhan, J ; Zhang, YP ; Zhang, JP ; Shi, LY |
| 刊名 | JOURNAL OF MATERIALS CHEMISTRY
 |
| 出版日期 | 2012 |
| 卷号 | 22期号:39页码:21154-21158 |
| ISSN号 | 0959-9428 |
| 通讯作者 | Wang, JH (reprint author), Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shangda Rd 99, Shanghai 200444, Peoples R China. |
| 中文摘要 | A new method is developed in this work to fabricate large area poly(3-hexylthiophene) (P3HT) micro/nano-patterns. The method is based on solvent-infiltration imprint lithography (SIIL). P3HT micro/nano-patterns, including micro-prism arrays, nano-grating |
| 学科主题 | Chemistry; Materials Science |
| 原文出处 | 10.1039/c2jm35086f |
| 公开日期 | 2013-04-17 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/114828]  |
| 专题 | 上海微系统与信息技术研究所_功能材料与器件_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang, JH,Min, GQ,Song, ZT,et al. Solvent-infiltration imprint lithography: a novel method to prepare large area poly(3-hexylthiophene) micro/nano-patterns[J]. JOURNAL OF MATERIALS CHEMISTRY,2012,22(39):21154-21158. |
| APA | Wang, JH.,Min, GQ.,Song, ZT.,Ni, XY.,Zhou, WM.,...&Shi, LY.(2012).Solvent-infiltration imprint lithography: a novel method to prepare large area poly(3-hexylthiophene) micro/nano-patterns.JOURNAL OF MATERIALS CHEMISTRY,22(39),21154-21158. |
| MLA | Wang, JH,et al."Solvent-infiltration imprint lithography: a novel method to prepare large area poly(3-hexylthiophene) micro/nano-patterns".JOURNAL OF MATERIALS CHEMISTRY 22.39(2012):21154-21158. |
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