中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electric Field Control of Interface Related Spin Splitting in Step Quantum Wells

文献类型:期刊论文

作者Hao GD
刊名chinese physics letters
出版日期2009
卷号26期号:7页码:art. no. 077104
关键词CONDUCTION SUBBANDS INVERSION ASYMMETRY HETEROSTRUCTURES RASHBA LAYERS INAS
ISSN号0256-307x
通讯作者hao yf chinese acad sci inst semicond key lab semicond mat sci pob 912 beijing 100083 peoples r china. e-mail address: yhchen@red.semi.ac.cn
中文摘要spin splitting of the alyga1-yas/gaas/alxga1-xas/alyga1-yas (x not equal y) step quantum wells (qws) has been theoretically investigated with a model that includes both the interface and the external electric field contribution. the overall spin splitting is mainly determined by the interface contribution, which can be well manipulated by the external electric field. in the absence of the electric field, the rashba effect exists due to the internal structure inversion asymmetry (sia). the electric field can strengthen or suppress the internal sia, resulting in an increase or decrease of the spin splitting. the step qw, which results in large spin splitting, has advantages in applications to spintronic devices compared with symmetrical and asymmetrical qws. due to the special structure design, the spin splitting does not change with the external electric field.
学科主题半导体化学
收录类别SCI
资助信息national basic research program of china 2006cb921607 2006cb604908 national natural science foundation of china 60625402
语种英语
公开日期2010-03-08
源URL[http://ir.semi.ac.cn/handle/172111/7089]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Hao GD. Electric Field Control of Interface Related Spin Splitting in Step Quantum Wells[J]. chinese physics letters,2009,26(7):art. no. 077104.
APA Hao GD.(2009).Electric Field Control of Interface Related Spin Splitting in Step Quantum Wells.chinese physics letters,26(7),art. no. 077104.
MLA Hao GD."Electric Field Control of Interface Related Spin Splitting in Step Quantum Wells".chinese physics letters 26.7(2009):art. no. 077104.

入库方式: OAI收割

来源:半导体研究所

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