Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment
文献类型：期刊论文
| 作者 | Zhang XW ; Yin ZG; You JB
|
| 刊名 | applied physics letters
 |
| 出版日期 | 2009 |
| 卷号 | 94期号:26页码:art. no. 262105 |
| 关键词 | atomic force microscopy field emission hydrogen II-VI semiconductors plasma materials processing sputter deposition wide band gap semiconductors work function zinc compounds |
| ISSN号 | 0003-6951 |
| 通讯作者 | zhang xw chinese acad sci inst semicond key lab semicond mat sci beijing 100083 peoples r china. e-mail address: xwzhang@semi.ac.cn |
| 中文摘要 | the zno films deposited by magnetron sputtering were treated by h/o plasma. it is found that the field emission (fe) characteristics of the zno film are considerably improved after h-plasma treatment and slightly deteriorated after o-plasma treatment. the improvement of fe characteristics is attributed to the reduced work function and the increased conductivity of the zno h films. conductive atomic force microscopy was employed to investigate the effect of the plasma treatment on the nanoscale conductivity of zno, these findings correlate well with the fe data and facilitate a clearer description of electron emission from the zno h films. |
| 学科主题 | 半导体物理 |
| 收录类别 | SCI |
| 资助信息 | national natural science foundation of china 50601025 60876031"863" project of china 2009aa03z305 postgraduate research, innovation and practice this work was financially supported by the national natural science foundation of china (50601025 and 60876031) and the "863" project of china (2009aa03z305). j. b. you thanks the cas special grant for postgraduate research, innovation and practice. |
| 语种 | 英语 |
| 公开日期 | 2010-03-08 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/7127]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Zhang XW,Yin ZG,You JB. Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment[J]. applied physics letters,2009,94(26):art. no. 262105. |
| APA | Zhang XW,Yin ZG,&You JB.(2009).Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment.applied physics letters,94(26),art. no. 262105. |
| MLA | Zhang XW,et al."Enhancement of field emission of the ZnO film by the reduced work function and the increased conductivity via hydrogen plasma treatment".applied physics letters 94.26(2009):art. no. 262105. |
入库方式： OAI收割
来源：半导体研究所
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