中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Evolution of surface morphology and photoluminescence characteristics of 1.3-mu m In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy

文献类型:期刊论文

作者Wei QX ; Ren ZW ; He ZH ; Niu ZC
刊名chinese optics letters
出版日期2009
卷号7期号:1页码:52-55
关键词1.3 MU-M ROOM-TEMPERATURE OPTICAL-PROPERTIES CAP LAYER GAAS DEPOSITION
ISSN号1671-7694
通讯作者wei qx shanxi univ dept phys taiyuan 030006 peoples r china. e-mail address: qx.wei@163.com
中文摘要evolution of surface morphology and optical characteristics of 1.3-mu m in0.5ga0.5as/gaas quantum dots (qds) grown by molecular beam epitaxy (mbe) are investigated by atomic force microscopy (afm) and photoluminescence (pl). after deposition of 16 monolayers (ml) of in0.5ga0.5as, qds are formed and elongated along the [110] direction when using sub-ml depositions, while large size ingaas qds with better uniformity are formed when using ml or super-ml depositions. it is also found that the larger size qds show enhanced pl efficiency without optical nonlinearity, which is in contrast to the elongated qds.
学科主题光电子学
收录类别SCI
资助信息national natural science foundation of china 10734060 national basic research program of china 2006cb921504 this work was supported by the national natural science foundation of china (no. 10734060) and the national basic research program of china (no. 2006cb921504).
语种英语
公开日期2010-03-08
源URL[http://ir.semi.ac.cn/handle/172111/7137]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Wei QX,Ren ZW,He ZH,et al. Evolution of surface morphology and photoluminescence characteristics of 1.3-mu m In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy[J]. chinese optics letters,2009,7(1):52-55.
APA Wei QX,Ren ZW,He ZH,&Niu ZC.(2009).Evolution of surface morphology and photoluminescence characteristics of 1.3-mu m In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy.chinese optics letters,7(1),52-55.
MLA Wei QX,et al."Evolution of surface morphology and photoluminescence characteristics of 1.3-mu m In0.5Ga0.5As/GaAs quantum dots grown by molecular beam epitaxy".chinese optics letters 7.1(2009):52-55.

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来源:半导体研究所

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