Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals
文献类型：期刊论文
| 作者 | Wang HL ; Xing MX ; Ren G ; Zheng WH |
| 刊名 | journal of vacuum science & technology b
 |
| 出版日期 | 2009 |
| 卷号 | 27期号:3页码:1093-1096 |
| 关键词 | III-V semiconductors indium compounds photonic crystals plasma materials processing semiconductor lasers sputter etching |
| ISSN号 | 1071-1023 |
| 通讯作者 | zheng wh chinese acad sci inst semicond nanooptoelect lab beijing 100083 peoples r china. e-mail address: whzheng@red.semi.ac.cn |
| 中文摘要 | the authors developed an inductively coupled plasma etching process for the fabrication of hole-type photonic crystals in inp. the etching was performed at 70 degrees c using bcl3/cl-2 chemistries. a high etch rate of 1.4 mu m/min was obtained for 200 nm diameter holes. the process also yields nearly cylindrical hole shape with a 10.8 aspect ratio and more than 85 degrees straightness of the smooth sidewall. surface-emitting photonic crystal laser and edge emitting one were demonstrated in the experiments. |
| 学科主题 | 光电子学 |
| 收录类别 | SCI |
| 资助信息 | national programs of china 10634080 60677046608380032006cb921700 this work was supported by national programs of china (grant nos. 10634080, 60677046, 60838003, and 2006cb921700). |
| 语种 | 英语 |
| 公开日期 | 2010-03-08 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/7141]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Wang HL,Xing MX,Ren G,et al. Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals[J]. journal of vacuum science & technology b,2009,27(3):1093-1096. |
| APA | Wang HL,Xing MX,Ren G,&Zheng WH.(2009).Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals.journal of vacuum science & technology b,27(3),1093-1096. |
| MLA | Wang HL,et al."Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals".journal of vacuum science & technology b 27.3(2009):1093-1096. |
入库方式： OAI收割
来源：半导体研究所
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