The correlation between electric field emission phenomenon and Schottky contact reverse bias characteristics in nanostructured systems
文献类型：期刊论文
| 作者 | J. Yu ; J. Liu ; M. Breedon ; M. Shafiei ; Wen H(文豪) ; Li YX(李永祥) ; W. Wlodarski ; G. Zhang ; K. Kalantar-zadeh |
| 刊名 | J. Appl. Phys.
 |
| 出版日期 | 2011-06-13 |
| 卷号 | 109期号:11页码:114316 |
| ISSN号 | 0021-8979 |
| 其他题名 | The correlation between electric field emission phenomenon and Schottky contact reverse bias characteristics in nanostructured systems |
| 通讯作者 | J. Yu |
| 学科主题 | 无机非金属材料 |
| 收录类别 | SCI收录 |
| WOS记录号 | WOS:000292214700139 |
| 公开日期 | 2012-07-05 |
| 源URL | [http://ir.sic.ac.cn/handle/331005/1206]  |
| 专题 | 上海硅酸盐研究所_无机功能材料与器件重点实验室_期刊论文 |
| 推荐引用方式 GB/T 7714 | J. Yu,J. Liu,M. Breedon,et al. The correlation between electric field emission phenomenon and Schottky contact reverse bias characteristics in nanostructured systems[J]. J. Appl. Phys.,2011,109(11):114316. |
| APA | J. Yu.,J. Liu.,M. Breedon.,M. Shafiei.,文豪.,...&K. Kalantar-zadeh.(2011).The correlation between electric field emission phenomenon and Schottky contact reverse bias characteristics in nanostructured systems.J. Appl. Phys.,109(11),114316. |
| MLA | J. Yu,et al."The correlation between electric field emission phenomenon and Schottky contact reverse bias characteristics in nanostructured systems".J. Appl. Phys. 109.11(2011):114316. |
入库方式： OAI收割
来源：上海硅酸盐研究所
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