中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Strain relaxation and band-gap tunability in ternary InxGa1-xN nanowires

文献类型:期刊论文

作者Li JB
刊名physical review b
出版日期2008
卷号78期号:19页码:art. no. 193301
关键词density functional theory energy gap enthalpy gallium compounds ground states III-V semiconductors indium compounds Monte Carlo methods nanowires semiconductor quantum wires wide band gap semiconductors
ISSN号1098-0121
通讯作者xiang hj natl renewable energy lab golden co 80401 usa. e-mail address: suhuai_wei@nrel.gov ; jbli@semi.ac.cn
中文摘要the alloy formation enthalpy and band structure of ingan nanowires were studied by a combined approach of the valence-force field model, monte carlo simulation, and density-functional theory (dft). for both random and ground-state structures of the coherent ingan alloy, the nanowire configuration was found to be more favorable for the strain relaxation than the bulk alloy. we proposed an analytical formula for computing the band gap of any ingan nanowires based on the results from the screened exchange hybrid dft calculations, which in turn reveals a better band-gap tunability in ternary ingan nanowires than the bulk alloy.
学科主题半导体物理
收录类别SCI
资助信息u.s. department of energy de-ac36-99go10337 chinese academy of sciences work at nrel was supported by the u.s. department of energy under contract no. de-ac36-99go10337. we thank g. kresse for providing us the vasp 5.1 code. j.l. gratefully acknowledges financial support from the "one-hundred talents plan" of the chinese academy of sciences.
语种英语
公开日期2010-03-08
源URL[http://ir.semi.ac.cn/handle/172111/7411]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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GB/T 7714
Li JB. Strain relaxation and band-gap tunability in ternary InxGa1-xN nanowires[J]. physical review b,2008,78(19):art. no. 193301.
APA Li JB.(2008).Strain relaxation and band-gap tunability in ternary InxGa1-xN nanowires.physical review b,78(19),art. no. 193301.
MLA Li JB."Strain relaxation and band-gap tunability in ternary InxGa1-xN nanowires".physical review b 78.19(2008):art. no. 193301.

入库方式: OAI收割

来源:半导体研究所

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