Fabrication of high quality two-dimensional photonic crystal mask layer patterns
文献类型：期刊论文
| 作者 | Peng, YS (Peng, Yin-Sheng) ; Xu, B (Xu, Bo) ; Ye, XL (Ye, Xiao-Ling) ; Niu, JB (Niu, Jie-Bin) ; Jia, R (Jia, Rui) ; Wang, ZG (Wang, Zhan-Guo) |
| 刊名 | optical and quantum electronics
 |
| 出版日期 | 2009 |
| 卷号 | 41期号:3页码:151-158 |
| 关键词 | Photonic crystal |
| ISSN号 | 0306-8919 |
| 通讯作者 | peng, ys, chinese acad sci, inst semicond, key lab semicond mat sci, beijing 100083, peoples r china. 电子邮箱地址: cynthia@semi.ac.cn |
| 中文摘要 | this work discusses the fabrication of two-dimensional photonic crystal mask layer patterns. photonic crystal patterns having holes with smooth and straight sidewalls are achieved by optimizing electron beam exposure doses during electron beam lithography process. thereafter, to precisely transfer the patterns from the beam resist to the sio2 mask layer, we developed a pulse-time etching method and optimize various reaction ion etching conditions. results show that we can obtain high quality two-dimensional photonic crystal mask layer patterns. |
| 学科主题 | 半导体材料 |
| 收录类别 | SCI |
| 资助信息 | 973 program of china 2006cb604904 national nature science foundation of china 60676029 |
| 语种 | 英语 |
| 公开日期 | 2010-03-08 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/7499]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Peng, YS ,Xu, B ,Ye, XL ,et al. Fabrication of high quality two-dimensional photonic crystal mask layer patterns[J]. optical and quantum electronics,2009,41(3):151-158. |
| APA | Peng, YS ,Xu, B ,Ye, XL ,Niu, JB ,Jia, R ,&Wang, ZG .(2009).Fabrication of high quality two-dimensional photonic crystal mask layer patterns.optical and quantum electronics,41(3),151-158. |
| MLA | Peng, YS ,et al."Fabrication of high quality two-dimensional photonic crystal mask layer patterns".optical and quantum electronics 41.3(2009):151-158. |
入库方式： OAI收割
来源：半导体研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。