中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Stone-Wales defects created by low energy recoils in single-walled silicon carbide nanotubes

文献类型:期刊论文

作者Wang ZG (Wang Zhiguo) ; Gao F (Gao Fei) ; Li JB (Li Jingbo) ; Zu XT (Zu Xiaotao) ; Weber WJ (Weber William J.)
刊名journal of applied physics
出版日期2009
卷号106期号:8页码:art.no.084305
关键词BETA-SIC NANORODS
ISSN号0021-8979
通讯作者wang, zg, univ elect sci & technol china, dept appl phys, chengdu 610054, peoples r china. 电子邮箱地址: zgwang@uestc.edu.cn ; fei.gao@pnl.gov ; jbli@semi.ac.cn
中文摘要the defect creation at low energy events was studied using density functional theory molecular dynamics simulations in silicon carbide nanotubes, and the displacement threshold energies determined exhibit a dependence on sizes, which decrease with decreasing diameter of the nanotubes. the stone-wales (sw) defect, which is a common defect configurations induced through irradiation in nanotubes, has also been investigated, and the formation energies of the sw defects increase with increasing diameter of the nanotubes. the mean threshold energies were found to be 23 and 18 ev for si and c in armchair (5,5) nanotubes. (c) 2009 american institute of physics. [doi: 10.1063/1.3238307]
学科主题半导体物理
收录类别SCI
资助信息national natural science foundation of china 10704014 sichuan young scientists foundation 09zq026029 phd funding support program of education ministry of china 20090450052
语种英语
公开日期2010-03-08
源URL[http://ir.semi.ac.cn/handle/172111/7553]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Wang ZG ,Gao F ,Li JB ,et al. Stone-Wales defects created by low energy recoils in single-walled silicon carbide nanotubes[J]. journal of applied physics,2009,106(8):art.no.084305.
APA Wang ZG ,Gao F ,Li JB ,Zu XT ,&Weber WJ .(2009).Stone-Wales defects created by low energy recoils in single-walled silicon carbide nanotubes.journal of applied physics,106(8),art.no.084305.
MLA Wang ZG ,et al."Stone-Wales defects created by low energy recoils in single-walled silicon carbide nanotubes".journal of applied physics 106.8(2009):art.no.084305.

入库方式: OAI收割

来源:半导体研究所

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