Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer
文献类型：期刊论文
| 作者 | Wu, AM ; Chen, J ; Zhang, EX ; Wang, X（重点实验室） ; Zhang, ZX（重点实验室） |
| 刊名 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY
 |
| 出版日期 | 2008 |
| 卷号 | 23期号:1页码:15015 |
| 关键词 | Engineering Materials Science Physics Electrical & Electronic Multidisciplinary Condensed Matter |
| ISSN号 | 0268-1242 |
| 学科主题 | Engineering; Materials Science; Physics |
| 收录类别 | SCI |
| 原文出处 | 10.1088/0268-1242/23/1/015015 |
| 语种 | 英语 |
| 公开日期 | 2013-05-10 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/115086]  |
| 专题 | 上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wu, AM,Chen, J,Zhang, EX,et al. Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer[J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY,2008,23(1):15015. |
| APA | Wu, AM,Chen, J,Zhang, EX,Wang, X,&Zhang, ZX.(2008).Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer.SEMICONDUCTOR SCIENCE AND TECHNOLOGY,23(1),15015. |
| MLA | Wu, AM,et al."Effect of nanoclusters induced by Si implantation on total dose radiation response of a SOI wafer".SEMICONDUCTOR SCIENCE AND TECHNOLOGY 23.1(2008):15015. |
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