中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs

文献类型:期刊论文

作者Chen, J ; Luo, JX ; Wu, QQ ; Chai, Z ; Huang, XL ; Wei, X ; Wang, X(重点实验室)
刊名NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
出版日期2012
卷号272页码:128-131
关键词Instruments & Instrumentation Physics Physics Nuclear Science & Technology Atomic Nuclear Molecular & Chemical
ISSN号0168-583X
学科主题Instruments & Instrumentation; Nuclear Science & Technology; Physics
收录类别SCI
原文出处10.1016/j.nimb.2011.01.048
语种英语
公开日期2013-05-10
源URL[http://ir.sim.ac.cn/handle/331004/115142]  
专题上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文
推荐引用方式
GB/T 7714
Chen, J,Luo, JX,Wu, QQ,et al. Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2012,272:128-131.
APA Chen, J.,Luo, JX.,Wu, QQ.,Chai, Z.,Huang, XL.,...&Wang, X.(2012).Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,272,128-131.
MLA Chen, J,et al."Extra source implantation for suppression floating-body effect in partially depleted SOI MOSFETs".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 272(2012):128-131.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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