中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Transportation of carriers in silicon implanted SiO2 films during ionizing radiation

文献类型:期刊论文

作者Chen, M ; Zhang, Z(重点实验室)X ; Wei, X ; Bi, DW(重点实验室) ; Zou, S(重点实验室)C ; Wang, X(重点实验室)
刊名NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
出版日期2012
卷号272页码:266-270
关键词Instruments & Instrumentation Physics Physics Nuclear Science & Technology Atomic Nuclear Molecular & Chemical
ISSN号0168-583X
学科主题Instruments & Instrumentation; Nuclear Science & Technology; Physics
收录类别SCI
原文出处10.1016/j.nimb.2011.01.080
语种英语
公开日期2013-05-10
源URL[http://ir.sim.ac.cn/handle/331004/115144]  
专题上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文
推荐引用方式
GB/T 7714
Chen, M,Zhang, Z,Wei, X,et al. Transportation of carriers in silicon implanted SiO2 films during ionizing radiation[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,2012,272:266-270.
APA Chen, M,Zhang, Z,Wei, X,Bi, DW,Zou, S,&Wang, X.(2012).Transportation of carriers in silicon implanted SiO2 films during ionizing radiation.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,272,266-270.
MLA Chen, M,et al."Transportation of carriers in silicon implanted SiO2 films during ionizing radiation".NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS 272(2012):266-270.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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