中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Temperature dependence of photoluminescence from as-grown and plasma-etched InAs0.45P0.55/In0.68Ga0.32As0.45P0.55 strained single quantum well

文献类型:期刊论文

作者Cao, M ; Wu, HZ ; Lao, YF ; Cao, CF ; Liu, C ; Hu, GJ
刊名JOURNAL OF ALLOYS AND COMPOUNDS
出版日期2010
卷号491期号:41276页码:595-598
关键词Chemistry Materials Science Physical Multidisciplinary Metallurgy & Metallurgical Engineering
ISSN号0925-8388
学科主题Chemistry; Materials Science; Metallurgy & Metallurgical Engineering
收录类别SCI
原文出处10.1016/j.jallcom.2009.11.014
语种英语
公开日期2013-05-10
源URL[http://ir.sim.ac.cn/handle/331004/115256]  
专题上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文
推荐引用方式
GB/T 7714
Cao, M,Wu, HZ,Lao, YF,et al. Temperature dependence of photoluminescence from as-grown and plasma-etched InAs0.45P0.55/In0.68Ga0.32As0.45P0.55 strained single quantum well[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2010,491(41276):595-598.
APA Cao, M,Wu, HZ,Lao, YF,Cao, CF,Liu, C,&Hu, GJ.(2010).Temperature dependence of photoluminescence from as-grown and plasma-etched InAs0.45P0.55/In0.68Ga0.32As0.45P0.55 strained single quantum well.JOURNAL OF ALLOYS AND COMPOUNDS,491(41276),595-598.
MLA Cao, M,et al."Temperature dependence of photoluminescence from as-grown and plasma-etched InAs0.45P0.55/In0.68Ga0.32As0.45P0.55 strained single quantum well".JOURNAL OF ALLOYS AND COMPOUNDS 491.41276(2010):595-598.

入库方式: OAI收割

来源:上海微系统与信息技术研究所

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