Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
文献类型：期刊论文
| 作者 | Wang, LY ; Liu, B(重点实验室） ; (重点实验室） ; song, zt(重点实验室） ; Liu, WL ; Feng, SL(重点实验室） ; Huang, D ; Babu, SV |
| 刊名 | ELECTROCHEMICAL AND SOLID STATE LETTERS
 |
| 出版日期 | 2011 |
| 卷号 | 14期号:3页码:H128-H131 |
| 关键词 | Electrochemistry Materials Science Multidisciplinary |
| ISSN号 | 1099-0062 |
| 学科主题 | Electrochemistry; Materials Science |
| 收录类别 | SCI |
| 原文出处 | 10.1149/1.3519883 |
| 语种 | 英语 |
| 公开日期 | 2013-05-10 |
| 源URL | [http://ir.sim.ac.cn/handle/331004/115496]  |
| 专题 | 上海微系统与信息技术研究所_信息功能材料国家重点实验室2008-2012_期刊论文 |
| 推荐引用方式 GB/T 7714 | Wang, LY,Liu, B,et al. Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films[J]. ELECTROCHEMICAL AND SOLID STATE LETTERS,2011,14(3):H128-H131. |
| APA | Wang, LY.,Liu, B.,.,song, zt.,Liu, WL.,...&Babu, SV.(2011).Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films.ELECTROCHEMICAL AND SOLID STATE LETTERS,14(3),H128-H131. |
| MLA | Wang, LY,et al."Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films".ELECTROCHEMICAL AND SOLID STATE LETTERS 14.3(2011):H128-H131. |
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