中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Photoluminescence study on Eu-implanted GaN

文献类型:期刊论文

作者Zhang CG ; Bian LF ; Chen WD
刊名chinese physics
出版日期2005
卷号14期号:10页码:2141-2144
关键词photoluminescence
ISSN号1009-1963
通讯作者zhang, cg, chinese acad sci, inst semicond, state key lab surface phys, beijing 100083, peoples r china. 电子邮箱地址: zhangcg@semi.ac.cn
中文摘要the photoluminescence (pl) properties of eu-implanted gan thin films are studied. the experimental results show that the pl intensity is seriously affected by ion implantation conditions. the pl efficiency increases exponentially with annealing temperature increasing up to a maximum temperature of 1050 degrees c. moreover, the pl intensity for the sample implanted along the channelling direction is nearly twice more than that observed from the sample implanted along the random direction. the thermal quenching of pl intensity from 10k to 300k for sample annealed at 1050 degrees c is only 42.7%.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-03-17
源URL[http://ir.semi.ac.cn/handle/172111/8482]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhang CG,Bian LF,Chen WD. Photoluminescence study on Eu-implanted GaN[J]. chinese physics,2005,14(10):2141-2144.
APA Zhang CG,Bian LF,&Chen WD.(2005).Photoluminescence study on Eu-implanted GaN.chinese physics,14(10),2141-2144.
MLA Zhang CG,et al."Photoluminescence study on Eu-implanted GaN".chinese physics 14.10(2005):2141-2144.

入库方式: OAI收割

来源:半导体研究所

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