中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Improved DC and RF performance of AlGaN/GaN HEMTs grown by MOCVD on sapphire substrates

文献类型:期刊论文

作者Wang XL ; Wang CM ; Hu GX ; Wang JX ; Chen TS ; Jiao G ; Li JP ; Zeng YP ; Li JM
刊名solid-state electronics
出版日期2005
卷号49期号:8页码:1387-1390
ISSN号0038-1101
关键词HEMT
通讯作者wang, xl, chinese acad sci, inst semicond, pob 912, beijing 100083, peoples r china. 电子邮箱地址: xlwang@red.semi.ac.cn ; cmwang@red.semi.ac.cn
中文摘要high-quality algan/gan high electron mobility transistor (hemt) structures were grown by metalorganic chemical vapor deposition (mocvd) on 2-in. sapphire substrates. two-dimensional electron gas (2deg) mobility of 1410 cm(2)/vs and concentration of 1.0x10(13) cm-2 are obtained at 295 k from the hemt structures, whose average sheet resistance and sheet resistance uniformity are measured to be about 395 omega/sq and 96.65% on 2-in. wafers, respectively. algan/gan hemts with 0.8 mu m gate length and 0.2 mm gate width were fabricated and characterized using the grown hemt structures. maximum current density of 0.9 a/ mm, peak extrinsic transconductance of 290 ms/mm, unity cutoff frequency (f(t)) of 20 ghz and maximum oscillation frequency (f(max) of 46 ghz are achieved. these results represent significant improvements over the previously fabricated devices with the same gate length, which are attributed to the improved performances of the mocvd-grown hemt structures. (c) 2005 elsevier ltd. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-03-17
源URL[http://ir.semi.ac.cn/handle/172111/8488]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Wang XL,Wang CM,Hu GX,et al. Improved DC and RF performance of AlGaN/GaN HEMTs grown by MOCVD on sapphire substrates[J]. solid-state electronics,2005,49(8):1387-1390.
APA Wang XL.,Wang CM.,Hu GX.,Wang JX.,Chen TS.,...&Li JM.(2005).Improved DC and RF performance of AlGaN/GaN HEMTs grown by MOCVD on sapphire substrates.solid-state electronics,49(8),1387-1390.
MLA Wang XL,et al."Improved DC and RF performance of AlGaN/GaN HEMTs grown by MOCVD on sapphire substrates".solid-state electronics 49.8(2005):1387-1390.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。