中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Lateral phase separation in AlGaN grown on GaN with a high-temperature AIN interlayer

文献类型:期刊论文

作者Yang H; Yang H; Wang H; Jiang DS; Zhang SM; Wang H
刊名applied physics letters
出版日期2005
卷号87期号:12页码:art.no.121914
关键词CHEMICAL-VAPOR-DEPOSITION
ISSN号0003-6951
通讯作者sun, q, chinese acad sci, state key lab integrated optoelect, inst semicond, pob 912, beijing 100083, peoples r china. 电子邮箱地址: qsun@red.semi.ac.cn
中文摘要the influences of a high-temperature (ht) aln interlayer (il) on the phase separation in crack-free algan grown on gan have been studied. the depth-dependent cathodoluminescence (cl) spectra indicate a relatively uniform al distribution in the growth direction, but the monochromatic cl images and the cl spectra obtained by line scan measurements reveal a lateral phase separation in algan grown on relatively thick ht-aln ils. moreover, when increasing the thickness of ht-aln il, the domain-like distribution of the aln mole fraction in algan layers is significantly enhanced through a great reduction of the domain size. the morphology of mesa-like small islands separated by v trenches in the ht-aln il, and the grain template formed by the coalescence of these islands during the subsequent algan lateral overgrowth, are attributed to be responsible for the formation of domain-like structures in the algan layer. (c) 2005 american institute of physics.
学科主题光电子学
收录类别SCI
语种英语
公开日期2010-03-17
源URL[http://ir.semi.ac.cn/handle/172111/8530]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Yang H,Yang H,Wang H,et al. Lateral phase separation in AlGaN grown on GaN with a high-temperature AIN interlayer[J]. applied physics letters,2005,87(12):art.no.121914.
APA Yang H,Yang H,Wang H,Jiang DS,Zhang SM,&Wang H.(2005).Lateral phase separation in AlGaN grown on GaN with a high-temperature AIN interlayer.applied physics letters,87(12),art.no.121914.
MLA Yang H,et al."Lateral phase separation in AlGaN grown on GaN with a high-temperature AIN interlayer".applied physics letters 87.12(2005):art.no.121914.

入库方式: OAI收割

来源:半导体研究所

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