The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering
文献类型:期刊论文
作者 | Zhou BQ ; Liu FZ ; Zhu MF ; Gu JH ; Zhou YQ ; Liu JL ; Dong BZ ; Li GH ; Ding K |
刊名 | acta physica sinica
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出版日期 | 2005 |
卷号 | 54期号:5页码:2172-2175 |
关键词 | hydrogenated microcrystalline silicon thin film |
ISSN号 | 1000-3290 |
通讯作者 | zhou, bq, chinese acad sci, grad sch, dept phys, beijing 100039, peoples r china. 电子邮箱地址: zhoubq@mails.gscas.ac.cn |
中文摘要 | the microstructures of hydrogenated microcrystalline silicon (tic-si: h) thin films, prepared by plasma-enhanced chemical vapor deposition (pecvd), hot wire cvd(hwcvd) and plasma assisted hwcvd (pe-hwcvd), have been analyzed by the small angle x-ray scattering(saxs) measurement. the saxs data show that the microstructures of the μ c-si: h films display different characteristics for different deposition techniques. for films deposited by pecvd, the volume fraction of micro-voids and mean size are smaller than those in hwcvd sample. aided by suitable ion-bombardment, pe-hwcvd samples show a more compact structure than the hwcvd sample. the microstructure parameters of the μ c-si: h thin films deposited by two-steps hwcvd and pe-hwcvd with ar ions are evidently improved. the result of 45° tilting saxs measurement indicates that the distribution of micro-voids in the film is anisotropic. the fouriertransform infrared spectra confirm the saxs data. |
学科主题 | 半导体物理 |
收录类别 | SCI |
语种 | 中文 |
公开日期 | 2010-03-17 |
源URL | [http://ir.semi.ac.cn/handle/172111/8732] ![]() |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Zhou BQ,Liu FZ,Zhu MF,et al. The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering[J]. acta physica sinica,2005,54(5):2172-2175. |
APA | Zhou BQ.,Liu FZ.,Zhu MF.,Gu JH.,Zhou YQ.,...&Ding K.(2005).The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering.acta physica sinica,54(5),2172-2175. |
MLA | Zhou BQ,et al."The microstructure of hydrogenated microcrystalline silicon thin films studied by small-angle x-ray scattering".acta physica sinica 54.5(2005):2172-2175. |
入库方式: OAI收割
来源:半导体研究所
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