Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films
文献类型：期刊论文
| 作者 | Yu, Ge ; Liu, Ya ; Hong, Danhong ; Li, Donglin ; Zang, Jianxin |
| 刊名 | advanced materials research
 |
| 出版日期 | 2012 |
| 页码 | 557-559 |
| 学科主题 | 半导体材料 |
| 收录类别 | EI |
| 语种 | 英语 |
| 公开日期 | 2013-05-07 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/23975]  |
| 专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
| 推荐引用方式 GB/T 7714 | Yu, Ge,Liu, Ya,Hong, Danhong,et al. Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films[J]. advanced materials research,2012:557-559. |
| APA | Yu, Ge,Liu, Ya,Hong, Danhong,Li, Donglin,&Zang, Jianxin.(2012).Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films.advanced materials research,557-559. |
| MLA | Yu, Ge,et al."Influence of sputtering power and substrate temperature on properties of Al2O3-doped ZnO films".advanced materials research (2012):557-559. |
入库方式： OAI收割
来源：半导体研究所
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