Reactive sputtering deposition of Gd-doped AlN thin film
文献类型：期刊论文
| ; | |
| 作者 | Wu, Rong; Pan, Dong; Jian, Jikang; Li, Jin |
| 刊名 | advanced materials research
 ; Advanced Materials Research
|
| 出版日期 | 2012 ; 2012 |
| 卷号 | 586页码:221-224 |
| 学科主题 | 半导体物理 ; 半导体物理 |
| 收录类别 | EI |
| 语种 | 英语 ; 英语 |
| 公开日期 | 2013-05-07 ; 2013-05-07 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/23998]  |
| 专题 | 半导体研究所_半导体超晶格国家重点实验室 |
| 推荐引用方式 GB/T 7714 | Wu, Rong,Pan, Dong,Jian, Jikang,et al. Reactive sputtering deposition of Gd-doped AlN thin film, Reactive sputtering deposition of Gd-doped AlN thin film[J]. advanced materials research, Advanced Materials Research,2012, 2012,586, 586:221-224, 221-224. |
| APA | Wu, Rong,Pan, Dong,Jian, Jikang,&Li, Jin.(2012).Reactive sputtering deposition of Gd-doped AlN thin film.advanced materials research,586,221-224. |
| MLA | Wu, Rong,et al."Reactive sputtering deposition of Gd-doped AlN thin film".advanced materials research 586(2012):221-224. |
入库方式： OAI收割
来源：半导体研究所
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