Metal stanogermanide contacts with enhanced thermal stability for high mobility germanium-tin field-effect transistor
文献类型:期刊论文
作者 | Wang, Lanxiang ; Han, Genquan ; Su, Shaojian ; Cheng, Buwen ; Yeo, Yee-Chia ; Zhou, Qian ; Yang, Yue ; Guo, Pengfei ; Wang, Wei ; Tong, Yi ; Lim, Phyllis Shi Ya ; Xue, Chunlai ; Wang, Qiming |
刊名 | international symposium on vlsi technology, systems, and applications, proceedings
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出版日期 | 2012 |
页码 | 6210151 |
学科主题 | 光电子学 |
收录类别 | EI |
语种 | 英语 |
公开日期 | 2013-05-07 |
源URL | [http://ir.semi.ac.cn/handle/172111/23993] ![]() |
专题 | 半导体研究所_集成光电子学国家重点实验室 |
推荐引用方式 GB/T 7714 | Wang, Lanxiang,Han, Genquan,Su, Shaojian,et al. Metal stanogermanide contacts with enhanced thermal stability for high mobility germanium-tin field-effect transistor[J]. international symposium on vlsi technology, systems, and applications, proceedings,2012:6210151. |
APA | Wang, Lanxiang.,Han, Genquan.,Su, Shaojian.,Cheng, Buwen.,Yeo, Yee-Chia.,...&Wang, Qiming.(2012).Metal stanogermanide contacts with enhanced thermal stability for high mobility germanium-tin field-effect transistor.international symposium on vlsi technology, systems, and applications, proceedings,6210151. |
MLA | Wang, Lanxiang,et al."Metal stanogermanide contacts with enhanced thermal stability for high mobility germanium-tin field-effect transistor".international symposium on vlsi technology, systems, and applications, proceedings (2012):6210151. |
入库方式: OAI收割
来源:半导体研究所
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