中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Ordered InAs quantum dots with controllable periods grown on stripe-patterned GaAs substrates

文献类型:期刊论文

作者Ren, YY (Ren Yun-Yun) ; Xu, B (Xu Bo) ; Wang, ZG (Wang Zhan-Guo) ; Liu-Ming (Liu-Ming) ; Long, SB (Long Shi-Bing)
刊名chinese physics letters
出版日期2007
卷号24期号:9页码:2689-2691
关键词GE ISLANDS
ISSN号issn: 0256-307x
通讯作者ren, yy, chinese acad sci, inst semicond, lab semicond mat sci, pob 912, beijing 100083, peoples r china. 电子邮箱地址: yunyun_ren@mail.semi.ac.cn
中文摘要gaas (001) substrates are patterned by electron beam lithography and wet chemical etching to control the nucleation of inas quantum dots (qds). inas dots are grown on the stripe-patterned substrates by solid source molecular beam epitaxy, a thick buffer layer is deposited on the strip pattern before the deposition of inas. to enhance the surface diffusion length of the in atoms, inas is deposited with low growth rate and low as pressure. the afm images show that distinct one-dimensionally ordered inas qds with homogeneous size distribution are created, and the qds preferentially nucleate along the trench. with the increasing amount of deposited inas and the spacing of the trenches, a number of qds are formed beside the trenches. the distribution of additional qds is long-range ordered, always along the trenchs rather than across the spacing regions.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-03-29
源URL[http://ir.semi.ac.cn/handle/172111/9300]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Ren, YY ,Xu, B ,Wang, ZG ,et al. Ordered InAs quantum dots with controllable periods grown on stripe-patterned GaAs substrates[J]. chinese physics letters,2007,24(9):2689-2691.
APA Ren, YY ,Xu, B ,Wang, ZG ,Liu-Ming ,&Long, SB .(2007).Ordered InAs quantum dots with controllable periods grown on stripe-patterned GaAs substrates.chinese physics letters,24(9),2689-2691.
MLA Ren, YY ,et al."Ordered InAs quantum dots with controllable periods grown on stripe-patterned GaAs substrates".chinese physics letters 24.9(2007):2689-2691.

入库方式: OAI收割

来源:半导体研究所

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