Investigation of Ge-Si atomic interdiffusion in Ge nano-dots multilayer structure by double crystal X-ray diffraction
文献类型：期刊论文
| 作者 | Shi WH (Shi Wenhua) ; Zhao L (Zhao Lei) ; Luo LP (Luo Liping) ; Wang QM (Wang Qiming) |
| 刊名 | journal of materials science & technology
 |
| 出版日期 | 2007 |
| 卷号 | 23期号:3页码:301-303 |
| 关键词 | X-ray diffraction |
| ISSN号 | issn: 1005-0302 |
| 通讯作者 | shi, wh, chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china. 电子邮箱地址: whshi@red.semi.ac.cn |
| 中文摘要 | the fluctuations of the strained layer in a superlattice or quantum well can broaden the width of satellite peaks in double crystal x-ray diffraction (dcxrd) pattern. it is found that the width of the 0(th) peak is directly proportional to the fluctuation of the strained layer if the other related facts are ignored. by this method, the ge-si atomic interdiffusion in ge nano-dots and wetting layers has been investigated by dcxrd. it is found that thermal annealing can activate ge-si atomic interdiffusion and the interdiffusion in the nano-dots area is much stronger than that in the wetting layer area. therefore the fluctuation of the ge layer decreases and the distribution of ge atoms becomes homogeneous in the horizontal ge (gesi actually) layer, which make the width of the 0(th) peak narrow after annealing. |
| 学科主题 | 光电子学 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-03-29 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/9394]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Shi WH ,Zhao L ,Luo LP ,et al. Investigation of Ge-Si atomic interdiffusion in Ge nano-dots multilayer structure by double crystal X-ray diffraction[J]. journal of materials science & technology,2007,23(3):301-303. |
| APA | Shi WH ,Zhao L ,Luo LP ,&Wang QM .(2007).Investigation of Ge-Si atomic interdiffusion in Ge nano-dots multilayer structure by double crystal X-ray diffraction.journal of materials science & technology,23(3),301-303. |
| MLA | Shi WH ,et al."Investigation of Ge-Si atomic interdiffusion in Ge nano-dots multilayer structure by double crystal X-ray diffraction".journal of materials science & technology 23.3(2007):301-303. |
入库方式： OAI收割
来源：半导体研究所
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