中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Optimization of GaInNAs(Sb)/GaAs quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy

文献类型:期刊论文

作者Ni, HQ (Ni, H. Q.) ; Niu, ZC (Niu, Z. C.) ; Fang, ZD (Fang, Z. D.) ; Huang, SS (Huang, S. S.) ; Zhang, SY (Zhang, S. Y.) ; Wu, DH (Wu, D. H.) ; Shun, Z (Shun, Z.) ; Han, Q (Han, Q.) ; Wu, RH (Wu, R. H.)
刊名journal of crystal growth
出版日期2007
卷号301期号:0页码:125-128
关键词quantum wells
ISSN号issn: 0022-0248
通讯作者ni, hq, chinese acad sci, inst semicond, pob 912, beijing 100083, peoples r china. 电子邮箱地址: nihq@red.semi.ac.cn
中文摘要the inganas(sb)/(ganas)/gaas quantum wells (qws) emitting at 1.3-1.55 mu m have been grown by molecular beam epitaxy (mbe). the parameters of the radio frequency (rf) such as rf power and flow rate are optimized to reduce the damages from the ions or energetic species. the growth temperature is carefully controlled to prevent the phase segregation and strain relaxation. the effects of sb on the wavelength and quality are investigated. the ganas barrier is used to extend the wavelength and reduce the strain. a 1.5865 mu m inganas(sb)/ganas sqw edge emitting laser lasing at room temperature at continuous wave operation mode is demonstrated. (c) 2006 elsevier b.v. all rights reserved.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-03-29
源URL[http://ir.semi.ac.cn/handle/172111/9510]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Ni, HQ ,Niu, ZC ,Fang, ZD ,et al. Optimization of GaInNAs(Sb)/GaAs quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy[J]. journal of crystal growth,2007,301(0):125-128.
APA Ni, HQ .,Niu, ZC .,Fang, ZD .,Huang, SS .,Zhang, SY .,...&Wu, RH .(2007).Optimization of GaInNAs(Sb)/GaAs quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy.journal of crystal growth,301(0),125-128.
MLA Ni, HQ ,et al."Optimization of GaInNAs(Sb)/GaAs quantum wells at 1.3-1.55 mu m grown by molecular beam epitaxy".journal of crystal growth 301.0(2007):125-128.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。