中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Electron irradiation induced defects in high temperature annealed InP single crystal

文献类型:期刊论文

作者Wang B (Wang Bo) ; Zhao YW (Zhao You-Wen) ; Dong ZY (Dong Zhi-Yuan) ; Deng AH (Deng Ai-Hong) ; Miao SS (Miao Shan-Shan) ; Yang J (Yang Jun)
刊名acta physica sinica
出版日期2007
卷号56期号:3页码:1603-1607
关键词InP
ISSN号issn: 1000-3290
通讯作者zhao, yw, sichuan univ, coll phys sci & technol, dept appl phys, chengdu 610065, peoples r china. 电子邮箱地址: zhaoyw@red.semi.ac.cn
中文摘要electron irradiation induced defects in inp material which has been formed by high temperature annealing undoped inp in different atmosphere have been studied in this paper. in addition to fe acceptor, there is no obvious defect peak in the sample before irradiation, whereas five defect peaks with activation energies of 0.23 ev, 0.26 ev, 0.31 ev, 0.37 ev and 0.46 ev have been detected after irradiation. inp annealed in p ambient has more thermally induced defects, and the defects induced by electron irradiation have characteristics of complex defect. after irradiation, carrier concentration and mobility of the samples have suffered obvious changes. under the same condition, electron irradiation induced defects have fast recovery behavior in the fep2 ambient annealed inp. the nature of defects, as well as their recovery mechanism and influence on material property have been discussed from the results.
学科主题半导体物理
收录类别SCI
语种中文
公开日期2010-03-29
源URL[http://ir.semi.ac.cn/handle/172111/9582]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Wang B ,Zhao YW ,Dong ZY ,et al. Electron irradiation induced defects in high temperature annealed InP single crystal[J]. acta physica sinica,2007,56(3):1603-1607.
APA Wang B ,Zhao YW ,Dong ZY ,Deng AH ,Miao SS ,&Yang J .(2007).Electron irradiation induced defects in high temperature annealed InP single crystal.acta physica sinica,56(3),1603-1607.
MLA Wang B ,et al."Electron irradiation induced defects in high temperature annealed InP single crystal".acta physica sinica 56.3(2007):1603-1607.

入库方式: OAI收割

来源:半导体研究所

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