Systematic considerations for the patterning of photonic crystal devices by electron beam lithography
文献类型：期刊论文
| 作者 | Yu HJ (Yu Hejun) ; Yu JZ (Yu Jinzhong) ; Sun F (Sun Fei) ; Li ZY (Li Zhiyong) ; Chen SW (Chen Shaowu) |
| 刊名 | optics communications
 |
| 出版日期 | 2007 |
| 卷号 | 271期号:1页码:241-247 |
| ISSN号 | issn: 0030-4018 |
| 关键词 | photonic crystal |
| 通讯作者 | yu, hj, chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china. 电子邮箱地址: yhjun@red.semi.ac.cn |
| 中文摘要 | photonic crystal devices with feature sizes of a few hundred nanometers are often fabricated by electron beam lithography. the proximity effect, stitching error and resist profiles have significant influence on the pattern quality, and therefore determine the optical properties of the devices. in this paper, detailed analyses and simple solutions to these problems are presented. the proximity effect is corrected by the introduction of a compensating dose. the influence of the stitching error is alleviated by replacing the original access waveguides with taper-added waveguides, and the taper parameters are also discussed to get the optimal choice. it is demonstrated experimentally that patterns exposed with different doses have almost the same edge-profiles in the resist for the same development time, and that optimized etching conditions can improve the wall angle of the holes in the substrate remarkably. (c) 2006 elsevier b.v. all rights reserved. |
| 学科主题 | 光电子学 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-03-29 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/9662]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Yu HJ ,Yu JZ ,Sun F ,et al. Systematic considerations for the patterning of photonic crystal devices by electron beam lithography[J]. optics communications,2007,271(1):241-247. |
| APA | Yu HJ ,Yu JZ ,Sun F ,Li ZY ,&Chen SW .(2007).Systematic considerations for the patterning of photonic crystal devices by electron beam lithography.optics communications,271(1),241-247. |
| MLA | Yu HJ ,et al."Systematic considerations for the patterning of photonic crystal devices by electron beam lithography".optics communications 271.1(2007):241-247. |
入库方式： OAI收割
来源：半导体研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。