中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of an indium-doped barrier on enhanced near-ultraviolet emission from InGaN/AlGaN: In multiple quantum wells grown on Si(111)

文献类型:期刊论文

作者Wu JJ (Wu Jiejun) ; Zhang GY (Zhang Guoyi) ; Liu XL (Liu Xianglin) ; Zhu QS (Zhu Qinsheng) ; Wang ZG (Wang Zhanguo) ; Jia QJ (Jia Quanjie) ; Guo LP (Guo Liping)
刊名nanotechnology
出版日期2007
卷号18期号:1页码:art.no.015402
关键词CHEMICAL-VAPOR-DEPOSITION
ISSN号issn: 0957-4484
通讯作者wu, jj, peking univ, res ctr wide gap semicond, state key lab artificial microstruct & mesoscop, sch phys, beijing 100871, peoples r china. 电子邮箱地址: jiejunw@red.semi.ac.cn
中文摘要low indium content ingan/algan multiple quantum wells (mqws) have been grown on si(111) substrate by metal-organic chemical vapour deposition (mocvd). a new method of using an isoelectronic indium-doped algan barrier has been found to be very effective in improving the crystalline quality and interfacial abruptness of ingan quantum well layers. we grew five periods of in0.06ga0.94n/al0.20ga0.80n:in mqws with in-doped barrier layers and obtained strong near-ultraviolet (uv) emission (similar to 400 nm) at room temperature. an in-doped algan barrier improves the room-temperature pl intensity of ingan/algan mqws, making it a candidate barrier for a near-uv source on si substrate.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-03-29
源URL[http://ir.semi.ac.cn/handle/172111/9688]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Wu JJ ,Zhang GY ,Liu XL ,et al. Effect of an indium-doped barrier on enhanced near-ultraviolet emission from InGaN/AlGaN: In multiple quantum wells grown on Si(111)[J]. nanotechnology,2007,18(1):art.no.015402.
APA Wu JJ .,Zhang GY .,Liu XL .,Zhu QS .,Wang ZG .,...&Guo LP .(2007).Effect of an indium-doped barrier on enhanced near-ultraviolet emission from InGaN/AlGaN: In multiple quantum wells grown on Si(111).nanotechnology,18(1),art.no.015402.
MLA Wu JJ ,et al."Effect of an indium-doped barrier on enhanced near-ultraviolet emission from InGaN/AlGaN: In multiple quantum wells grown on Si(111)".nanotechnology 18.1(2007):art.no.015402.

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来源:半导体研究所

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