中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods

文献类型:期刊论文

作者Zhou B ; Pan SW ; Chen R ; Chen SY ; Li C ; Lai HK ; Yu ; JZ ; Zhu XF
刊名solid state communications
出版日期2009
卷号149期号:43-44页码:1897-1901
关键词Strain-induced Electrochemical anodization Silicon germanium Heterogeneous nanostructures POROUS SILICON LAYER VISIBLE PHOTOLUMINESCENCE SURFACE-MORPHOLOGY THIN-FILMS SI GERMANIUM SUPERLATTICES NANOCRYSTALS RELAXATION GROWTH
通讯作者chen, sy, xiamen univ, semicond photon res ctr, xiamen 361005, peoples r china. e-mail address: sychen@xmu.edu.cn
合作状况国内
学科主题光电子学
收录类别SCI
资助信息nation natural science foundation of china 50672079 60676027 60837001 60776007; national basic research program of china (973 program) 2007cb613404; china-most international sci & tech cooperation and exchange 2008dfa51230
语种英语
公开日期2010-04-04
源URL[http://ir.semi.ac.cn/handle/172111/10199]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhou B,Pan SW,Chen R,et al. Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods[J]. solid state communications,2009,149(43-44):1897-1901.
APA Zhou B.,Pan SW.,Chen R.,Chen SY.,Li C.,...&Zhu XF.(2009).Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods.solid state communications,149(43-44),1897-1901.
MLA Zhou B,et al."Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods".solid state communications 149.43-44(2009):1897-1901.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。