Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods
文献类型:期刊论文
作者 | Zhou B ; Pan SW ; Chen R ; Chen SY ; Li C ; Lai HK ; Yu ; JZ ; Zhu XF |
刊名 | solid state communications
![]() |
出版日期 | 2009 |
卷号 | 149期号:43-44页码:1897-1901 |
关键词 | Strain-induced Electrochemical anodization Silicon germanium Heterogeneous nanostructures POROUS SILICON LAYER VISIBLE PHOTOLUMINESCENCE SURFACE-MORPHOLOGY THIN-FILMS SI GERMANIUM SUPERLATTICES NANOCRYSTALS RELAXATION GROWTH |
通讯作者 | chen, sy, xiamen univ, semicond photon res ctr, xiamen 361005, peoples r china. e-mail address: sychen@xmu.edu.cn |
合作状况 | 国内 |
学科主题 | 光电子学 |
收录类别 | SCI |
资助信息 | nation natural science foundation of china 50672079 60676027 60837001 60776007; national basic research program of china (973 program) 2007cb613404; china-most international sci & tech cooperation and exchange 2008dfa51230 |
语种 | 英语 |
公开日期 | 2010-04-04 |
源URL | [http://ir.semi.ac.cn/handle/172111/10199] ![]() |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Zhou B,Pan SW,Chen R,et al. Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods[J]. solid state communications,2009,149(43-44):1897-1901. |
APA | Zhou B.,Pan SW.,Chen R.,Chen SY.,Li C.,...&Zhu XF.(2009).Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods.solid state communications,149(43-44),1897-1901. |
MLA | Zhou B,et al."Strain-induced anodization of SiGe/Si multiple layers to form high density SiGe/Si heterogeneous nanorods".solid state communications 149.43-44(2009):1897-1901. |
入库方式: OAI收割
来源:半导体研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。