Shrinkage of nanocavities in silicon during electron beam irradiation
文献类型：期刊论文
| 作者 | Zhu XF (Zhu Xianfang) |
| 刊名 | journal of applied physics
 |
| 出版日期 | 2006 |
| 卷号 | 100期号:3页码:art.no.034304 |
| 关键词 | PREFERENTIAL AMORPHIZATION ION IRRADIATION AMORPHOUS SI IN-SITU VOIDS |
| ISSN号 | 0021-8979 |
| 通讯作者 | zhu, xf, xiamen univ, dept phys, lab low dimens nanostruct, xiamen 316005, peoples r china. e-mail: xianfangzhu@hotmail.com |
| 中文摘要 | an internal shrinkage of nanocavity in silicon was in situ observed under irradiation of energetic electron on electron transmission microscopy. because there is no addition of any external materials to cavity site, a predicted nanosize effect on the shrinkage was observed. at the same time, because there is no ion cascade effect as encountered in the previous ion irradiation-induced nanocavity shrinkage experiment, the electron irradiation-induced instability of nanocavity also provides a further more convincing evidence to demonstrate the predicted irradiation-induced athermal activation effect. (c) 2006 american institute of physics. |
| 学科主题 | 半导体物理 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-04-11 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/10460]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Zhu XF . Shrinkage of nanocavities in silicon during electron beam irradiation[J]. journal of applied physics,2006,100(3):art.no.034304. |
| APA | Zhu XF .(2006).Shrinkage of nanocavities in silicon during electron beam irradiation.journal of applied physics,100(3),art.no.034304. |
| MLA | Zhu XF ."Shrinkage of nanocavities in silicon during electron beam irradiation".journal of applied physics 100.3(2006):art.no.034304. |
入库方式： OAI收割
来源：半导体研究所
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