中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Temperature dependence of surface quantum dots grown under frequent growth interruption

文献类型:期刊论文

作者Jin P; Xu B
刊名physica e-low-dimensional systems & nanostructures
出版日期2006
卷号33期号:1页码:207-210
关键词growth interruption in segregation surface oxide molecular beam epitaxy quantum dots MOLECULAR-BEAM EPITAXY GAAS PHOTOLUMINESCENCE LAYER SHAPE SIZE
ISSN号1386-9477
通讯作者yu, lk, chinese acad sci, inst semicond, key lab semicond mat sci, pob 912, beijing 100083, peoples r china. e-mail: yulike@red.semi.ac.cn
中文摘要we grow ingaas quantum dot (qd) at low growth rate with 70 times insertion of growth interruption in mbe system. it is found that because of the extreme growth condition, qds exhibit a thick wetting layer, large qd height value and special surface morphology which is attributed to the enhanced adatom surface diffusion and in-segregation effect. temperature dependence of photoluminescence measurement from surface qd shows that this kind of qd has good thermal stability which is explained in terms of the presence of surface oxide. the special distribution of qd may also play a role in this thermal character. (c) 2006 elsevier b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-04-11
源URL[http://ir.semi.ac.cn/handle/172111/10580]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Jin P,Xu B. Temperature dependence of surface quantum dots grown under frequent growth interruption[J]. physica e-low-dimensional systems & nanostructures,2006,33(1):207-210.
APA Jin P,&Xu B.(2006).Temperature dependence of surface quantum dots grown under frequent growth interruption.physica e-low-dimensional systems & nanostructures,33(1),207-210.
MLA Jin P,et al."Temperature dependence of surface quantum dots grown under frequent growth interruption".physica e-low-dimensional systems & nanostructures 33.1(2006):207-210.

入库方式: OAI收割

来源:半导体研究所

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