Fabrication of metallic air bridges using multiple-dose electron beam lithography
文献类型：期刊论文
| 作者 | Liu J
|
| 刊名 | applied physics letters
 |
| 出版日期 | 2006 |
| 卷号 | 88期号:20页码:art.no.202103 |
| 关键词 | SILICON VOLTAGE |
| ISSN号 | 0003-6951 |
| 通讯作者 | girgis, e, natl res ctr, dept solid state phys, el behoos st, cairo 11325, egypt. e-mail: e_girgis@nrc.sci.eg |
| 中文摘要 | the techniques of fabricating metallic air bridges using different resists in a one-step electron beam lithography are presented. the exposure process employed a single-layer polymethyl methacrylate (pmma) or photoresists with either different doses in the span and feet areas or with varying acceleration voltage of the electron beam. the process using photoresists with different doses has produced air bridges more stable than what the pmma method using various acceleration voltages would achieve. using this method, air bridges up to 12 mu m long have been fabricated. the length and height of these metallic air bridges vary with the photoresist thickness. (c) 2006 american institute of physics. |
| 学科主题 | 半导体物理 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-04-11 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/10668]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Liu J. Fabrication of metallic air bridges using multiple-dose electron beam lithography[J]. applied physics letters,2006,88(20):art.no.202103. |
| APA | Liu J.(2006).Fabrication of metallic air bridges using multiple-dose electron beam lithography.applied physics letters,88(20),art.no.202103. |
| MLA | Liu J."Fabrication of metallic air bridges using multiple-dose electron beam lithography".applied physics letters 88.20(2006):art.no.202103. |
入库方式： OAI收割
来源：半导体研究所
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