中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Growth of InAs quantum dots on vicinal GaAs (100) substrates by metalorganic chemical vapor deposition and their optical properties

文献类型:期刊论文

作者Ye XL; Liang S; Pan JQ
刊名journal of crystal growth
出版日期2006
卷号289期号:2页码:477-484
关键词bimodal size distribution metalorganic vapor phase epitaxy self-assembled quantum dots indium arsenide PHASE-EPITAXY ISLANDS INGAAS SIZE LASER
ISSN号0022-0248
通讯作者liang, s, chinese acad sci, inst semicond, natl res ctr optoelect technol, beijing 100083, peoples r china. e-mail: liangsong@red.semi.ac.cn
中文摘要the growth of inas quantum dots on vicinal gaas (100) substrates was systematically studied using low-pressure metalorganic chemical vapor deposition (mocvd). the dots showed a clear bimodal size distribution on vicinal substrates. the way of evolution of this bimodal size distribution was studied as a function of growth temperature, inas layer thickness and inas deposition rate. the optical properties of dots grown on vicinal substrates were also studied by photoluminescence (pl). it was found that, compared with dots on exact substrates, dots on vicinal substrates had better optical properties such as a narrower pl line width, a longer emission wavelength, and a larger pl intensity. (c) 2006 elsevier b.v. all rights reserved.
学科主题光电子学
收录类别SCI
语种英语
公开日期2010-04-11
源URL[http://ir.semi.ac.cn/handle/172111/10736]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Ye XL,Liang S,Pan JQ. Growth of InAs quantum dots on vicinal GaAs (100) substrates by metalorganic chemical vapor deposition and their optical properties[J]. journal of crystal growth,2006,289(2):477-484.
APA Ye XL,Liang S,&Pan JQ.(2006).Growth of InAs quantum dots on vicinal GaAs (100) substrates by metalorganic chemical vapor deposition and their optical properties.journal of crystal growth,289(2),477-484.
MLA Ye XL,et al."Growth of InAs quantum dots on vicinal GaAs (100) substrates by metalorganic chemical vapor deposition and their optical properties".journal of crystal growth 289.2(2006):477-484.

入库方式: OAI收割

来源:半导体研究所

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