Enhancement of 1.53 mu m photoluminescence from spin-coated Er-Si-O (Er2SiO5) crystalline films by nitrogen plasma treatment
文献类型：期刊论文
| 作者 | Wang XX ; Zhang JG ; Cheng BW ; Yu JZ ; Wang QM |
| 刊名 | journal of crystal growth
 |
| 出版日期 | 2006 |
| 卷号 | 289期号:1页码:178-182 |
| 关键词 | photoluminescence spin-coating rare earth compounds MU-M SILICON ERBIUM ZNO |
| ISSN号 | 0022-0248 |
| 通讯作者 | wang, xx, chinese acad sci, inst semicond, state key lab integrated optoelect, beijing 100083, peoples r china. e-mail: wangxiaoxin@red.semi.ac.cn |
| 中文摘要 | er-si-o (er2sio5) crystalline films are fabricated by the spin-coating and subsequent annealing process. the fraction of erbium is estimated to be 21.5 at% based on rutherford backscattering measurement. x-ray diffraction pattern indicates that the er-si-o films are similar to er2sio5 compound in the crystal structure. the fine structure of room-temperature photoluminescence of er3+-related transitions suggests that er has a local environment similar to the er-o-6 octahedron. our preliminary results show that the intensity of 1.53 mu m emission is enhanced by a factor of seven after nitrogen plasma treatment by nh3 gas with subsequent post-annealing. the full-width at half-maximum of 1.53 pm emission peak increases from 7.5 to 12.9 nm compared with that of the untreated one. nitrogen plasma treatment is assumed to tailor er3+ local environment, increasing the oscillator strength of transitions and thus the excitation/emission cross-section. (c) 2005 elsevier b.v. all rights reserved. |
| 学科主题 | 光电子学 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-04-11 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/10780]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Wang XX,Zhang JG,Cheng BW,et al. Enhancement of 1.53 mu m photoluminescence from spin-coated Er-Si-O (Er2SiO5) crystalline films by nitrogen plasma treatment[J]. journal of crystal growth,2006,289(1):178-182. |
| APA | Wang XX,Zhang JG,Cheng BW,Yu JZ,&Wang QM.(2006).Enhancement of 1.53 mu m photoluminescence from spin-coated Er-Si-O (Er2SiO5) crystalline films by nitrogen plasma treatment.journal of crystal growth,289(1),178-182. |
| MLA | Wang XX,et al."Enhancement of 1.53 mu m photoluminescence from spin-coated Er-Si-O (Er2SiO5) crystalline films by nitrogen plasma treatment".journal of crystal growth 289.1(2006):178-182. |
入库方式： OAI收割
来源：半导体研究所
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