中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Corrugated surfaces formed on GaAs(331)A substrates: the template for laterally ordered InGaAs nanowires

文献类型:期刊论文

作者Gong Z ; Niu ZC ; Fang ZD
刊名nanotechnology
出版日期2006
卷号17期号:4页码:1140-1145
关键词MOLECULAR-BEAM EPITAXY QUANTUM-DOT SUPERLATTICES VICINAL GAAS(001) GAAS WIRES POLARIZATION GROWTH WELLS TEMPERATURE MECHANISM
ISSN号0957-4484
通讯作者niu, zc, chinese acad sci, inst semicond, state key lab superlattices & microstruct, pob 912, beijing 100083, peoples r china. e-mail: zheng.gong@strath.ac.uk ; zcniu@red.semi.ac.cn
中文摘要morphology evolution of high-index gaas(331)a surfaces during molecular beam epitaxy (mbe) growth has been investigated in order to achieve regularly distributed step-array templates and fabricate spatially ordered low-dimensional nano-structures. atomic force microscope (afm) measurements have shown that the step height and terrace width of gaas layers increase monotonically with increasing substrate temperature. by using the step arrays formed on gaas(331)a surfaces as the templates, we have fabricated highly ordered ingaas nanowires. the improved homogeneity and the increased density of the ingaas nanowires are attributed to the modulated strain field caused by vertical multi-stacking, as well as the effect of corrugated surface of the template. photoluminescence (pl) tests confirmed remarkable polarization anisotropy.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-04-11
源URL[http://ir.semi.ac.cn/handle/172111/10784]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Gong Z,Niu ZC,Fang ZD. Corrugated surfaces formed on GaAs(331)A substrates: the template for laterally ordered InGaAs nanowires[J]. nanotechnology,2006,17(4):1140-1145.
APA Gong Z,Niu ZC,&Fang ZD.(2006).Corrugated surfaces formed on GaAs(331)A substrates: the template for laterally ordered InGaAs nanowires.nanotechnology,17(4),1140-1145.
MLA Gong Z,et al."Corrugated surfaces formed on GaAs(331)A substrates: the template for laterally ordered InGaAs nanowires".nanotechnology 17.4(2006):1140-1145.

入库方式: OAI收割

来源:半导体研究所

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