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Stress and its effect on optical properties of GaN epilayers grown on Si(111), 6H-SiC(0001), and c-plane sapphire

文献类型:期刊论文

作者Zhao DG
刊名applied physics letters
出版日期2003
卷号83期号:4页码:677-679
关键词VAPOR-PHASE EPITAXY PHONON DEFORMATION POTENTIALS MOLECULAR-BEAM EPITAXY RAMAN-SCATTERING ALPHA-GAN ALN LAYERS STRAIN WURTZITE FILMS
ISSN号0003-6951
通讯作者xu sj,univ hong kong,dept phys,pokfulam rd,hong kong,hong kong,peoples r china.
中文摘要the stress states in unintentionally doped gan epilayers grown on si(111), 6h-sic(0001), and c-plane sapphire, and their effects on optical properties of gan films were investigated by means of room-temperature confocal micro-raman scattering and photoluminescence techniques. relatively large tensile stress exists in gan epilayers grown on si and 6h-sic while a small compressive stress appears in the film grown on sapphire. the latter indicates effective strain relaxation in the gan buffer layer inserted in the gan/sapphire sample, while the 50-nm-thick aln buffer adopted in the gan/si sample remains highly strained. the analysis shows that the thermal mismatch between the epilayers and the substrates plays a major role in determining the residual strain in the films. finally, a linear coefficient of 21.1+/-3.2 mev/gpa characterizing the relationship between the luminescent bandgap and the biaxial stress of the gan films is obtained. (c) 2003 american institute of physics.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/11504]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Zhao DG. Stress and its effect on optical properties of GaN epilayers grown on Si(111), 6H-SiC(0001), and c-plane sapphire[J]. applied physics letters,2003,83(4):677-679.
APA Zhao DG.(2003).Stress and its effect on optical properties of GaN epilayers grown on Si(111), 6H-SiC(0001), and c-plane sapphire.applied physics letters,83(4),677-679.
MLA Zhao DG."Stress and its effect on optical properties of GaN epilayers grown on Si(111), 6H-SiC(0001), and c-plane sapphire".applied physics letters 83.4(2003):677-679.

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来源:半导体研究所

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