GaN1-xPx ternary alloys with high P composition grown by metal-organic chemical vapor deposition
文献类型:期刊论文
作者 | Chen DJ ; Shen B ; Bi ZX ; Zhang KX ; Gu SL ; Zhang R ; Shi Y ; Zheng YD ; Sun XH ; Wan SK ; Wang ZG |
刊名 | journal of crystal growth
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出版日期 | 2003 |
卷号 | 255期号:1-2页码:52-56 |
关键词 | metalorganic chemical vapor deposition nitrides semiconducting III-V materials MOLECULAR-BEAM EPITAXY GAN-RICH SIDE RADICAL CELL III-V |
ISSN号 | 0022-0248 |
通讯作者 | shen b,nanjing univ,natl lab solid state microstruct,nanjing 210093,peoples r china. |
中文摘要 | gan1-xpx ternary alloys with high p compositions were deposited on sapphire substrates by means of metal-organic chemical vapor deposition. depth profiles of the elements indicate that the maximum p/n composition ratio is about 17% and a uniform distribution of the p atoms in the alloys is achieved. 2theta/omega xrd spectra demonstrate that the (0002) peak of the gan1-xpx alloys shifts to smaller angle with increasing p composition. from the photoluminescence (pl) spectra, the red shifts to the bandedge emission of gan are determined to be 73, 78, 100 and 87 mev for the gan1-xpx alloys with the p/n composition ratios of 3%, 11%, 15% and 17%, respectively. no pl peak related to gap is observed, indicating that the phase separation between gan and gap is well suppressed in our gan1-xpx samples. (c) 2003 elsevier science b.v. all rights reserved. |
学科主题 | 半导体材料 |
收录类别 | SCI |
语种 | 英语 |
公开日期 | 2010-08-12 |
源URL | [http://ir.semi.ac.cn/handle/172111/11526] ![]() |
专题 | 半导体研究所_中国科学院半导体研究所(2009年前) |
推荐引用方式 GB/T 7714 | Chen DJ,Shen B,Bi ZX,et al. GaN1-xPx ternary alloys with high P composition grown by metal-organic chemical vapor deposition[J]. journal of crystal growth,2003,255(1-2):52-56. |
APA | Chen DJ.,Shen B.,Bi ZX.,Zhang KX.,Gu SL.,...&Wang ZG.(2003).GaN1-xPx ternary alloys with high P composition grown by metal-organic chemical vapor deposition.journal of crystal growth,255(1-2),52-56. |
MLA | Chen DJ,et al."GaN1-xPx ternary alloys with high P composition grown by metal-organic chemical vapor deposition".journal of crystal growth 255.1-2(2003):52-56. |
入库方式: OAI收割
来源:半导体研究所
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