中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Structure and photoluminescence study of InGaAs/GaAs quantum dots grown via cycled (InAs)(n)/(GaAs)(n) monolayer deposition

文献类型:期刊论文

作者He J ; Wang XD ; Xu B ; Wang ZG ; Qu SC
刊名japanese journal of applied physics part 1-regular papers short notes & review papers
出版日期2003
卷号42期号:3页码:1154-1157
关键词MBE InGaAs/GaAs quantum dots photoluminescence morphology MU-M WELL STRUCTURES GAAS LASERS TEMPERATURE STATES INP
ISSN号0021-4922
通讯作者he j,chinese acad sci,inst semicond,key lab semicond mat sci,pob 912,beijing 100083,peoples r china.
中文摘要we report the morphology of an ingaas nanostructure grown by molecular beam epitaxy via cycled (inas)(n)/(gaas)(n) monolayer deposition. atomic force microscopy images clearly show that varying monolayer deposition per cycle has significant influence on the size, density and shape of the ingaas nanostructure. low-temperature photoluminescence spectra show the effect of n on the optical quality, and 1.35mum photoluminescence with a linewidth of only 19.2mev at room temperature has been achieved in the (inas)(1)/(gaas)(1) structure.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/11594]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
He J,Wang XD,Xu B,et al. Structure and photoluminescence study of InGaAs/GaAs quantum dots grown via cycled (InAs)(n)/(GaAs)(n) monolayer deposition[J]. japanese journal of applied physics part 1-regular papers short notes & review papers,2003,42(3):1154-1157.
APA He J,Wang XD,Xu B,Wang ZG,&Qu SC.(2003).Structure and photoluminescence study of InGaAs/GaAs quantum dots grown via cycled (InAs)(n)/(GaAs)(n) monolayer deposition.japanese journal of applied physics part 1-regular papers short notes & review papers,42(3),1154-1157.
MLA He J,et al."Structure and photoluminescence study of InGaAs/GaAs quantum dots grown via cycled (InAs)(n)/(GaAs)(n) monolayer deposition".japanese journal of applied physics part 1-regular papers short notes & review papers 42.3(2003):1154-1157.

入库方式: OAI收割

来源:半导体研究所

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