中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Structure characteristics of InGaN quantum dots fabricated by passivation and low temperature method

文献类型:期刊论文

作者Qu BZ ; Chen Z ; Lu DC ; Han P ; Liu XG ; Wang XH ; Wang D ; Zhu QS ; Wang ZG
刊名journal of crystal growth
出版日期2003
卷号252期号:1-3页码:19-25
ISSN号0022-0248
关键词nanostructures metalorganic chemical vapor deposition nitrides CHEMICAL-VAPOR-DEPOSITION MOLECULAR-BEAM EPITAXY SIZE DISTRIBUTION GROWTH GAAS DEPENDENCE EMISSION NUMBER
通讯作者qu bz,acad sinica,inst semicond,lab semicond mat sci,pob 912,beijing 100083,peoples r china.
中文摘要passivation and low temperature method was carried out to grow ingan/gan quantum dots (qds). atomic force microscope observations were performed to investigate the evolution of the surface morphology of the ingan qds superlattices with increasing the superlattices layer number. the result shows that the size of the qds increases with increasing superlattices layer number. the qds height and diameter increase from 18 and 50 run for the monolayer ingan qds to 37 and 80 urn for the four-stacked ingan qds layers, respectively. this result is considered to be due to the stress field from the sub-layer dots. (c) 2003 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/11598]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
GB/T 7714
Qu BZ,Chen Z,Lu DC,et al. Structure characteristics of InGaN quantum dots fabricated by passivation and low temperature method[J]. journal of crystal growth,2003,252(1-3):19-25.
APA Qu BZ.,Chen Z.,Lu DC.,Han P.,Liu XG.,...&Wang ZG.(2003).Structure characteristics of InGaN quantum dots fabricated by passivation and low temperature method.journal of crystal growth,252(1-3),19-25.
MLA Qu BZ,et al."Structure characteristics of InGaN quantum dots fabricated by passivation and low temperature method".journal of crystal growth 252.1-3(2003):19-25.

入库方式: OAI收割

来源:半导体研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。