中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The effect of inserting strain-compensated GaNAs layers on the luminescence properties of GaInNAs/GaAs quantum well

文献类型:期刊论文

作者Jiang DS
刊名journal of crystal growth
出版日期2003
卷号250期号:3-4页码:339-344
关键词quantum wells GaInNAs strain-compensated GaNAs layers MOLECULAR-BEAM EPITAXY PHOTOLUMINESCENCE LASERS THRESHOLD
ISSN号0022-0248
通讯作者bian lf,chinese acad sci,inst semicond,state key lab superlattices & microstruct,pob 912,beijing 100083,peoples r china.
中文摘要photoluminescence (pl) properties of gainnas/gaas quantum wells (qws) with strain-compensated ganas layers grown by molecular beam epitaxy are investigated. the temperature-dependent pl spectra of gainnas/gaas qw with and without ganas layers are compared and carefully studied. it is shown that the introduction of ganas layers between well and barrier can effectively extend the emission wavelength, mainly due to the reduction of the barrier potential. the pl peak position up to 1.41 mum is observed at the room temperature. after adding the ganas layers into qw structures, there is no essential deterioration of luminescence efficiency. n-induced localization states are also not remarkably influenced. it implies that with optimized growth condition, high-quality gainnas/gaas qws with strain-compensated ganas layers can be achieved. (c) 2003 elsevier science b.v. all rights reserved.
学科主题半导体材料
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/11630]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
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Jiang DS. The effect of inserting strain-compensated GaNAs layers on the luminescence properties of GaInNAs/GaAs quantum well[J]. journal of crystal growth,2003,250(3-4):339-344.
APA Jiang DS.(2003).The effect of inserting strain-compensated GaNAs layers on the luminescence properties of GaInNAs/GaAs quantum well.journal of crystal growth,250(3-4),339-344.
MLA Jiang DS."The effect of inserting strain-compensated GaNAs layers on the luminescence properties of GaInNAs/GaAs quantum well".journal of crystal growth 250.3-4(2003):339-344.

入库方式: OAI收割

来源:半导体研究所

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