Surface morphology of ion-beam deposited carbon films under high temperature
文献类型：期刊论文
| 作者 | Liao MY ; Chai CL ; Yang SY ; Liu ZK ; Qin FG ; Wang ZG |
| 刊名 | journal of vacuum science & technology a-vacuum surfaces and films
 |
| 出版日期 | 2002 |
| 卷号 | 20期号:6页码:2072-2074 |
| 关键词 | ENERGY NANOTUBES SILICON GROWTH |
| ISSN号 | 0734-2101 |
| 通讯作者 | liao my,kyoto univ,ion beam engn expt lab,kyoto 6068501,japan. |
| 中文摘要 | carbon films with an open-ended structure were obtained by mass-selected ion-beam deposition technique at 800degreesc. raman spectra show that these films are mainly sp(2)-bonded. in our case, threshold ion energy of 140 ev was found for the formation of such surface morphology. high deposition temperature and ion-beam current density are also responsible for the growth of this structure. additionally, the growth mechanism of the carbon films is discussed in this article. it was found that the ions sputtered pits on the substrate in the initial stage play a key role in the tubular surface morphology. (c) 2002 american vacuum society. |
| 学科主题 | 半导体材料 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-08-12 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/11726]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Liao MY,Chai CL,Yang SY,et al. Surface morphology of ion-beam deposited carbon films under high temperature[J]. journal of vacuum science & technology a-vacuum surfaces and films,2002,20(6):2072-2074. |
| APA | Liao MY,Chai CL,Yang SY,Liu ZK,Qin FG,&Wang ZG.(2002).Surface morphology of ion-beam deposited carbon films under high temperature.journal of vacuum science & technology a-vacuum surfaces and films,20(6),2072-2074. |
| MLA | Liao MY,et al."Surface morphology of ion-beam deposited carbon films under high temperature".journal of vacuum science & technology a-vacuum surfaces and films 20.6(2002):2072-2074. |
入库方式： OAI收割
来源：半导体研究所
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