中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Comparative study on the broadening of exciton luminescence linewidth due to phonon in zinc-blende and wurtzite GaN epilayers

文献类型:期刊论文

作者Xu SJ ; Zheng LX ; Cheung SH ; Xie MH ; Tong SY ; Yang H
刊名applied physics letters
出版日期2002
卷号81期号:23页码:4389-4391
关键词MOLECULAR-BEAM EPITAXY VAPOR-PHASE EPITAXY CUBIC GAN BINDING-ENERGY PHOTOLUMINESCENCE PRESSURE ELECTRON GAAS ALN
ISSN号0003-6951
通讯作者xu sj,univ hong kong,dept phys,pokfulam rd,hong kong,hong kong,peoples r china.
中文摘要linewidth broadening of exciton luminescence in wurtzite and zinc-blende gan epilayers was investigated as a function of temperature with photoluminescence. a widely accepted theoretical model was used to fit the experimental data, so that the coupling parameters between exciton and acoustic and longitudinal optical phonons were obtained for both structures. it was found that the coupling constants of both exciton-acoustic optical phonon coupling and exciton-longitudinal optical phonon coupling for zinc-blende gan are almost twice as much as the corresponding values of wurtzite gan. these results show that the relatively strong exciton-phonon scattering seems to be characteristic to zinc-blende gan film. (c) 2002 american institute of physics.
学科主题半导体物理
收录类别SCI
语种英语
公开日期2010-08-12
源URL[http://ir.semi.ac.cn/handle/172111/11730]  
专题半导体研究所_中国科学院半导体研究所(2009年前)
推荐引用方式
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Xu SJ,Zheng LX,Cheung SH,et al. Comparative study on the broadening of exciton luminescence linewidth due to phonon in zinc-blende and wurtzite GaN epilayers[J]. applied physics letters,2002,81(23):4389-4391.
APA Xu SJ,Zheng LX,Cheung SH,Xie MH,Tong SY,&Yang H.(2002).Comparative study on the broadening of exciton luminescence linewidth due to phonon in zinc-blende and wurtzite GaN epilayers.applied physics letters,81(23),4389-4391.
MLA Xu SJ,et al."Comparative study on the broadening of exciton luminescence linewidth due to phonon in zinc-blende and wurtzite GaN epilayers".applied physics letters 81.23(2002):4389-4391.

入库方式: OAI收割

来源:半导体研究所

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