New calix[4]arene derivatives as maskless and development-free laser thermal lithography materials for fabricating micro/nano-patterns
文献类型：期刊论文
| 作者 | Deng CM(邓常猛) ; Geng YY(耿永友) ; Wu YQ(吴谊群) |
| 刊名 | j. mater. chem. c
 |
| 出版日期 | 2013-02-09 |
| 期号 | 1页码:2470-2476 |
| WOS记录号 | WOS:000315722900012 |
| 公开日期 | 2013-06-09 |
| 源URL | [http://ir.siom.ac.cn/handle/181231/10991]  |
| 专题 | 上海光学精密机械研究所_高密度光存储技术实验室 |
| 推荐引用方式 GB/T 7714 | Deng CM,Geng YY,Wu YQ. New calix[4]arene derivatives as maskless and development-free laser thermal lithography materials for fabricating micro/nano-patterns[J]. j. mater. chem. c,2013(1):2470-2476. |
| APA | Deng CM,Geng YY,&Wu YQ.(2013).New calix[4]arene derivatives as maskless and development-free laser thermal lithography materials for fabricating micro/nano-patterns.j. mater. chem. c(1),2470-2476. |
| MLA | Deng CM,et al."New calix[4]arene derivatives as maskless and development-free laser thermal lithography materials for fabricating micro/nano-patterns".j. mater. chem. c .1(2013):2470-2476. |
入库方式： OAI收割
来源：上海光学精密机械研究所
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