Nanofabrication of grid-patterned substrate by holographic lithography
文献类型：期刊论文
| 作者 | Huang CJ ; Zhu XP ; Li C ; Zuo YH ; Cheng BW ; Li DZ ; Luo LP ; Yu JZ ; Wang QM |
| 刊名 | journal of crystal growth
 |
| 出版日期 | 2002 |
| 卷号 | 236期号:1-3页码:141-144 |
| 关键词 | etching nanostructures substrates ASSEMBLED GE ISLANDS SI(001) GROWTH DOTS |
| ISSN号 | 0022-0248 |
| 通讯作者 | huang cj,chinese acad sci,inst semicond,state key lab integrated optoelect,pob 912,beijing 100083,peoples r china. |
| 中文摘要 | the two-dimensional grid patterns on si(001) in nanometer scale have been fabricated by holographic lithography and reactive ion etching, which can be used as a substrate for positioning ge islands during self-assembled epitaxy to obtain an ordered ge quantum dots matrix. by changing the configuration of the holographic lithography and the etching rate and time, we can control the grid period, the shape of the pattern cell, and the orientation of those shapes, respectively. (c) 2002 elsevier science b.v. all rights reserved. |
| 学科主题 | 半导体材料 |
| 收录类别 | SCI |
| 语种 | 英语 |
| 公开日期 | 2010-08-12 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/11958]  |
| 专题 | 半导体研究所_中国科学院半导体研究所（2009年前） |
| 推荐引用方式 GB/T 7714 | Huang CJ,Zhu XP,Li C,et al. Nanofabrication of grid-patterned substrate by holographic lithography[J]. journal of crystal growth,2002,236(1-3):141-144. |
| APA | Huang CJ.,Zhu XP.,Li C.,Zuo YH.,Cheng BW.,...&Wang QM.(2002).Nanofabrication of grid-patterned substrate by holographic lithography.journal of crystal growth,236(1-3),141-144. |
| MLA | Huang CJ,et al."Nanofabrication of grid-patterned substrate by holographic lithography".journal of crystal growth 236.1-3(2002):141-144. |
入库方式： OAI收割
来源：半导体研究所
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